ANELVA 912-7060 Canon Sputter Ion Noble Ultra High Vacuum Pump Ion/noble 400 L/sec

( Brand: Anelva ), ( Manufacturer Part Number: 912-7060 ), ( Type: Ultra High Vacuum Pump ), ( Unit Type: Unit ), ( Country Of Origin: Japan )

Review ANELVA Canon Sputter Ion/noble Ultra high Vacuum Pump 400 L/sec

The **Anelva 912-7060 Canon Sputter Ion/Noble Ultra-High Vacuum (UHV) Pump** is a high-performance, precision-engineered solution designed for demanding applications in semiconductor manufacturing, thin-film deposition, surface science research, and advanced materials processing. This pump combines the reliability of ion pumping technology with the efficiency of noble gas handling, making it an indispensable component for achieving and maintaining ultra-high vacuum environments typically below **10 Torr** where contamination control, high-purity deposition, and long-term stability are critical. Built upon Canon s legacy of vacuum innovation, the 912-7060 series leverages a **400-liter-per-second (L/s) pumping speed**, ensuring rapid evacuation and sustained vacuum integrity even in high-load scenarios, such as reactive sputtering or plasma-assisted processes. Its **sputter ion pump (SIP) design** utilizes a magnetic field to confine electrons, which then collide with noble gases (argon, xenon, or krypton) and other residual gases, ionizing them and accelerating them toward titanium alloy cathodes. This process effectively traps and neutralizes gases, preventing backstreaming and minimizing outgassing, which is essential for preserving the cleanliness of sensitive substrates and chamber walls. The pump s **noble gas compatibility** extends its utility beyond traditional ion pumping applications, allowing it to handle reactive gases and high-flux environments without degradation, a feature particularly valuable in **PVD (Physical Vapor Deposition), ALD (Atomic Layer Deposition), and plasma etching** systems.

The 912-7060 is constructed with **robust, corrosion-resistant materials**, including high-purity titanium cathodes and stainless steel housing, ensuring durability and longevity even under extreme thermal and mechanical stresses. Its **modular design** allows for easy integration into existing vacuum systems, with standard **CF (Conflat) or ISO-KF flanges** (depending on configuration) facilitating seamless connection to chambers, diffusion pumps, or turbomolecular pumps for pre-evacuation. The pump s **automatic gas handling** capabilities, including **argon and xenon compatibility**, eliminate the need for manual gas management, reducing operational downtime and enhancing process reproducibility. Additionally, the **built-in pressure gauge and diagnostic interfaces** provide real-time monitoring of pumping efficiency, gas load, and system health, enabling predictive maintenance and optimizing performance. For applications requiring **ultra-clean environments**, the 912-7060 can be paired with Anelva s **noble gas purification systems**, further refining the vacuum quality by removing trace impurities before they enter the process chamber.

Beyond its technical specifications, the 912-7060 excels in **energy efficiency and low heat generation**, a critical advantage in compact or thermally sensitive systems where excessive heat dissipation could compromise substrate integrity or require additional cooling infrastructure. Its **quiet operation** and **minimal vibration** make it suitable for sensitive analytical instruments, such as **XPS (X-ray Photoelectron Spectroscopy) or LEED (Low Energy Electron Diffraction) systems**, where mechanical noise could interfere with delicate measurements. The pump s **long service life**, often exceeding **10,000 hours** under optimal conditions, is further enhanced by Anelva s **proprietary cathode regeneration technology**, which extends the operational lifespan by reactivating the titanium cathodes without disassembly. This feature significantly reduces maintenance costs and minimizes downtime, making it a cost-effective solution for high-throughput manufacturing environments.

Ideal for **semiconductor wafer fabrication, optical coating, and advanced materials research**, the Anelva 912-7060 Canon Sputter Ion/Noble UHV Pump represents a fusion of cutting-edge engineering and vacuum science, delivering unmatched performance in the most exacting applications. Whether used in **high-precision thin-film deposition, surface modification, or plasma-based processes**, this pump ensures consistent, contamination-free vacuum performance, enabling researchers and engineers to push the boundaries of material science and device fabrication. With its **reliability, versatility, and scalability**, the 912-7060 stands as a cornerstone in modern vacuum technology, empowering industries to achieve breakthroughs in performance, purity, and innovation.

### **Pros and Cons of buying a Anelva 912-7060 (Canon Sputter Ion/Noble Ultra-High Vacuum Pump, 400 L/sec)**

#### **Pros**

1. **High Pumping Speed (400 L/sec)** Ideal for applications requiring rapid evacuation, such as thin-film deposition, surface analysis, or high-vacuum processing. This speed ensures efficient chamber pumping and reduces cycle times.

2. **Ultra-High Vacuum (UHV) Compatibility** Designed for UHV applications, making it suitable for sensitive experiments where contamination must be minimized. This is critical in fields like semiconductor research, materials science, and surface physics.

3. **Ion/Noble Gas Pumping Capability** The ability to pump noble gases (e.g., argon, helium) and ions is valuable for sputtering processes, plasma etching, and ion milling. This versatility extends its applicability beyond standard turbomolecular or cryogenic pumping.

4. **Long Lifespan and Durability** Anelva (now part of Canon) is known for high-quality, industrial-grade vacuum equipment with robust construction. Properly maintained, this pump can operate for decades, reducing long-term replacement costs.

5. **Low Outgassing** Critical for UHV systems, as it minimizes residual gas contamination, ensuring cleaner process environments.

6. **Compatibility with Mass Spectrometry and Surface Analysis** Often used in conjunction with techniques like Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), or time-of-flight secondary ion mass spectrometry (ToF-SIMS), where UHV is essential.

7. **Modular and Scalable Design** Can be integrated into larger vacuum systems or paired with other pumps (e.g., turbopumps, ion pumps) for hybrid configurations, offering flexibility in system design.

8. **Precision Control** Suitable for applications requiring fine control over gas flow and pressure, such as in research-grade thin-film deposition or plasma processing.

9. **Reduced Maintenance Compared to Cryopumps** Unlike cryogenic pumps, ion/noble gas pumps do not require frequent cooling system maintenance, though they do require periodic electrode replacement.

10. **Industrial and Research Provenance** Widely used in academia and industry for high-end applications, indicating reliability and performance in demanding environments.

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#### **Cons**

1. **High Initial Cost** One of the most significant drawbacks. The upfront investment is substantially higher than that of turbomolecular pumps or diaphragm pumps, making it less accessible for budget-conscious users.

2. **Complex Installation and Calibration** Requires specialized knowledge for proper setup, alignment, and integration into a vacuum system. Improper installation can lead to inefficiencies or damage.

3. **Limited Pumping Range for Certain Gases** While effective for noble gases and ions, its performance with reactive or condensable gases (e.g., water vapor, hydrocarbons) may require additional pumping stages (e.g., a roughing pump or cryopanel).

4. **Electrode Wear and Replacement Costs** The ion/noble gas pump uses electrodes that degrade over time, necessitating periodic replacement. These parts can be expensive, adding to long-term operational costs.

5. **Power Consumption** Runs on high voltage and current, leading to higher energy consumption compared to turbomolecular or diaphragm pumps. This can impact operational costs, especially in continuous-use applications.

6. **Sensitivity to Contamination** Like all UHV components, it is highly sensitive to oil backstreaming or particulate contamination. Requires meticulous system design to prevent such issues.

7. **Limited Availability of Spare Parts** As Anelva s market share has shifted, finding replacement parts or technical support may become more challenging over time compared to more widely used pumps.

8. **Not Ideal for High-Flow Applications** While it excels at UHV, its 400 L/sec speed may be insufficient for large-volume chambers or high-throughput processes where turbopumps or cryopumps might be more practical.

9. **Learning Curve for Operation** Users must understand vacuum principles, gas dynamics, and pump-specific controls to optimize performance, which may require training.

10. **Potential for Arcing or Failure Under Abnormal Conditions** If exposed to excessive gas loads, improper gases, or electrical faults, the pump can fail catastrophically. Proper safeguards (e.g., gas analyzers, pressure monitors) are essential.

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### **Conclusion and Recommendation**

The **Anelva 912-7060 (Canon sputter ion/noble UHV pump)** is a **high-performance, specialized vacuum pump** best suited for **research-grade applications requiring ultra-high vacuum, noble gas pumping, or ion-based processes**. Its strengths lie in its **speed, UHV compatibility, and precision**, making it indispensable in fields like **semiconductor research, surface science, thin-film deposition, and plasma processing**.

However, its **high cost, complexity, and maintenance requirements** limit its practicality for **industrial mass production, budget-sensitive applications, or general-purpose vacuum systems**. If your application demands **UHV, noble gas handling, or ion-based processes**, this pump is a **superior choice** despite its drawbacks. For **lower-cost, high-throughput, or non-UHV applications**, alternatives like **turbomolecular pumps, cryopumps, or diaphragm pumps** may be more economical and easier to maintain.

- **Buy if:** You require **UHV, noble gas pumping, or ion-based processes** in a **research or high-end industrial setting**, and budget constraints are not prohibitive. The pump s longevity and performance justify the investment for specialized applications.

- **Avoid if:** Your application does not require UHV, noble gas handling, or ion processes. In such cases, a **turbomolecular pump (e.g., Edwards, Pfeiffer) or a cryopump** may offer better cost-effectiveness and simplicity.

- **Consider alternatives:** If the pump is too expensive, explore **used/refurbished units** (with proper inspection) or **hybrid systems** (e.g., combining a turbopump with an ion pump for specific gas loads). Additionally, consult with **vacuum system integrators** to ensure compatibility with your existing setup.

Details:

No moving parts low vibration/noise. Suitable for inertial gas pumping noble pump.

part #: 9127060 prices

• $500.00-$4246.05

specifications valvplu:

• brand: Anelva
• mpn: 912-7060
• type: Ultra High Vacuum Pump
• unit type: Unit
• country of origin: Japan

general valvplu:

• condition: Used
• Pumps Pump Accessories > Vacuum Pumps > Other Vacuum Pumps

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• city: Sparta, Tennessee
• # reviews: 8829

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• started: April 13, 2026
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